《Table 1.Excited species identified in Ar/C2H5OH plasma.》
本系列图表出处文件名:随高清版一同展现
《OES diagnostic of radicals in 33MHz radio-frequency Ar/C_2H_5OH atmospheric pressure plasma jet》
When it was ignited for 10 min,a layer of black films was deposited on silicon wafer with 1 mm distance of sourcesubstrate.Finally as a supplement,the scanning electron microscopy(SEM)and x-ray photoelectron spectroscopy(XPS)of deposition films were given in figures 9 and 10respectively.The deposition time was 600 s.The ethanol content of the plasma jet was 3700 ppm.The RF input power was 70 W.Figures 9(a)and(b)show low and high magnification images obtained with the SEM(FESEM,Hitachi S-4800).It can be seen that the spherical particles are agglomerated into clusters.The diameters of the clusters are about several hundred nanometers.Figure 10 shows the XPS(PHI-5702)survey scan of the sample.This spectrum clearly indicated the C and O were presented in these films.The existence of oxygen in the sample maybe comes from OH or environmental O,or Si–O–Si bonds due to the oxidation of the silicon substrate.In order to prepare different carbonaceous films by using ethanol,further studies will concern to control the content of a specific carbonaceous species(C,CN or CH)through adding other gas,such as nitrogen,hydrogen.
图表编号 | XD0030230600 严禁用于非法目的 |
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绘制时间 | 2019.02.01 |
作者 | 袁强华、任佩、周永杰、殷桂琴、董晨钟 |
绘制单位 | Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu province,College of Physics and Electronic Engineering,Northwest Normal University、Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu province,Colle |
更多格式 | 高清、无水印(增值服务) |