《Table 1 Effects of the etching time on the porousity and thickness of the PS layer表1刻蚀时间对多孔硅孔隙度和厚度的
On the basis of Equation(1)and(2),Table 1shows the calculated results that the variation of the porosity and thickness at diverse anodization time,and that the porosity and thickness are very sensitive to the change of the reaction time.As the etching time increases,the porosity of the PS layer increases slightly at a fixed mole ratio of HF and C2H5HO,while the thickness grows rapidly.We can also notice that the average growth kinetics of the thickness is around 1.77μm/min in our range by means of linear fitting.
图表编号 | XD0028232100 严禁用于非法目的 |
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绘制时间 | 2019.03.15 |
作者 | 徐甲然、陈诺夫、石岱星、陶泉丽、吕国良、杨秀钰、张航、陈吉堃 |
绘制单位 | 华北电力大学可再生能源学院、华北电力大学可再生能源学院、华北电力大学可再生能源学院、华北电力大学可再生能源学院、华北电力大学可再生能源学院、华北电力大学可再生能源学院、华北电力大学可再生能源学院、北京科技大学材料学院 |
更多格式 | 高清、无水印(增值服务) |
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