《Table 2 Optical properties of ITO/F46 and ITO/PI》
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《Optical and Irradiation-Resistant Properties of ITO Films on F46 and PI Substrates》
ITO thin fi lms were prepared by DC magnetron sputtering method using a self-developed magnetron roll coating machine（Model JCJ-1200）equipped with three sputtering targets and a linear ion source[9].Before depositing ITO，F46 and PI substrates were cleaned by ion beam to activate the surface[10].The parameters of ITO deposition process on F46 and PI are listed in Table 1.An ITO target（99.99%purity）with In 2 O 3 and SnO 2 with a weight ratio of 90:10was used[11].
| 图表编号 | XD0076873400 严禁用于非法目的 |
|---|---|
| 绘制时间 | 2019.04.01 |
| 作者 | Chao Zhou、Hui Zhou、Yanchun He、Miao Yang、Yuqing Xiong、Lingmao Xu、Yi Wang |
| 绘制单位 | Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics、Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics、Science and Technology on Vacuum Technology and Physics Labor |
| 更多格式 | 高清、无水印（增值服务） |
