《Table 2 Corre lation of the amount of Mo Cl5and the laye r numbe r of Mo S2films[65]》

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《Review:Controllable Synthesis of Two-Dimensional (2D) MoS_2 by Chemical Vapor Deposition Process》

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Using M o Cl5as M o precursor，Yu et al.[65]developed a controllable strategy to prepare highquality monolayer and few-layer M o S2films w ith great uniformity.Typically，the M o Cl5and sulfur vapor can react to form M o S2species at elevated temperature，w hich might deposit onto the receiving substrates to produce M o S2films subsequently.It should be pointed out that the number of the obtained M o S2layers can be accurately modulated through changing the dosage of M o Cl5precursor used in experiments（Table 2）.In addition，they had also successfully synthesized uniform M o S2films on diverse substrates including Si O2/Si，sapphire and graphite.It w as important to highlight that this synthetic method can be scaled up for the applications of electronics and optoelectronics.